Equipment and Facilities
The laboratory is equipped with state-of-the-art instrumentation for advanced material synthesis, materials and device characterization, and ultrafast optical spectroscopy. We also utilize campus-wide facilities such as the UCR Nanofabrication Facility and the Central Facility for Advanced Microscopy and Microanalysis.
Our ultrahigh vacuum system (above) consists of two molecular beam epitaxy (MBE) systems which permit the atom-by-atom growth of thin films. One system is used for synthesizing magnetic oxides and metallic thin films. The second system is equipped with special in situ transport and optical measurement capabilities to measure spintronic properties of metal-doped graphene devices without exposing to air. Click here for more information on MBE.
|An Oxford Spectromag system allows optical and transport measurements to be performed in the temperature range of 1.5 - 300 K with magnetic fields up to 7 Tesla. We currently utilize this system for studying magnetotransport in graphene spin valves, induced magnetism in metal-doped graphene, and magneto-optic properties of magnetic oxides.|
|A Mira 900 Ti:sapphire laser system produces 150 fs optical pulses with 76 MHz repetition rate and a wavelength tuning between 700 and 1000 nm. We currently utilize this system to investigate the spin and magnetization dynamics in semiconductors and magnetic oxides.|
|A high temperature tube furnace is used for hot-wall chemical vapor deposition (CVD) with temperatures up to 1800 C and pressure ranging between 10-4 torr to atmospheric pressure. We currently use this system for the epitaxial growth of graphene films.|
|A magneto-optic Kerr effect (MOKE) system is utilized to measure the magnetic hysteresis loops of ultrathin magnetic films and multilayers. As shown to the right, the system is set up for polar MOKE in ambient. The system can also be set up for longitudinal MOKE and variable temperature using a flow cryostat. We currently use this system to investigate interlayer exchange coupling.|